Articles | Volume 20, issue 21
https://doi.org/10.5194/acp-20-13417-2020
© Author(s) 2020. This work is distributed under
the Creative Commons Attribution 4.0 License.
the Creative Commons Attribution 4.0 License.
https://doi.org/10.5194/acp-20-13417-2020
© Author(s) 2020. This work is distributed under
the Creative Commons Attribution 4.0 License.
the Creative Commons Attribution 4.0 License.
Technical note
| 
12 Nov 2020
Technical note |
| 12 Nov 2020
| 12 Nov 2020
Technical Note: Effect of varying the λ = 185 and 254 nm photon flux ratio on radical generation in oxidation flow reactors
Jake P. Rowe
Department of Meteorology and Atmospheric Science, Pennsylvania State University, University Park, PA, USA
now at: Department of Chemistry, University of Colorado, Boulder, CO, USA
Center for Aerosol and Cloud Chemistry, Aerodyne Research Inc., Billerica, MA, USA
William H. Brune
Department of Meteorology and Atmospheric Science, Pennsylvania State University, University Park, PA, USA
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Short summary
We conducted a series of experiments in which the 185 to 254 nm photon flux ratio (I185 : I254) emitted by low-pressure mercury lamps installed in an oxidation flow reactor (OFR) was systematically varied using multiple novel lamp configurations. Integrated OH exposure values achieved for each lamp type were obtained as a function of OFR operating conditions. A photochemical box model was used to develop a generalized OH exposure estimation equation as a function of [H2O], [O3], and OH reactivity.
We conducted a series of experiments in which the 185 to 254 nm photon flux ratio (I185 : I254)...
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