Articles | Volume 20, issue 21
https://doi.org/10.5194/acp-20-13417-2020
https://doi.org/10.5194/acp-20-13417-2020
Technical note
 | 
12 Nov 2020
Technical note |  | 12 Nov 2020

Technical Note: Effect of varying the λ = 185 and 254 nm photon flux ratio on radical generation in oxidation flow reactors

Jake P. Rowe, Andrew T. Lambe, and William H. Brune

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Latest update: 12 Jul 2024
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Short summary
We conducted a series of experiments in which the 185 to 254 nm photon flux ratio (I185 : I254) emitted by low-pressure mercury lamps installed in an oxidation flow reactor (OFR) was systematically varied using multiple novel lamp configurations. Integrated OH exposure values achieved for each lamp type were obtained as a function of OFR operating conditions. A photochemical box model was used to develop a generalized OH exposure estimation equation as a function of [H2O], [O3], and OH reactivity.
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