Articles | Volume 20, issue 21
https://doi.org/10.5194/acp-20-13417-2020
https://doi.org/10.5194/acp-20-13417-2020
Technical note
 | 
12 Nov 2020
Technical note |  | 12 Nov 2020

Technical Note: Effect of varying the λ = 185 and 254 nm photon flux ratio on radical generation in oxidation flow reactors

Jake P. Rowe, Andrew T. Lambe, and William H. Brune

Viewed

Total article views: 3,119 (including HTML, PDF, and XML)
HTML PDF XML Total Supplement BibTeX EndNote
2,091 970 58 3,119 402 73 98
  • HTML: 2,091
  • PDF: 970
  • XML: 58
  • Total: 3,119
  • Supplement: 402
  • BibTeX: 73
  • EndNote: 98
Views and downloads (calculated since 07 Jul 2020)
Cumulative views and downloads (calculated since 07 Jul 2020)

Viewed (geographical distribution)

Total article views: 3,119 (including HTML, PDF, and XML) Thereof 3,119 with geography defined and 0 with unknown origin.
Country # Views %
  • 1
1
 
 
 
 

Cited

Latest update: 13 Jul 2025
Download
Short summary
We conducted a series of experiments in which the 185 to 254 nm photon flux ratio (I185 : I254) emitted by low-pressure mercury lamps installed in an oxidation flow reactor (OFR) was systematically varied using multiple novel lamp configurations. Integrated OH exposure values achieved for each lamp type were obtained as a function of OFR operating conditions. A photochemical box model was used to develop a generalized OH exposure estimation equation as a function of [H2O], [O3], and OH reactivity.
Share
Altmetrics
Final-revised paper
Preprint