Articles | Volume 20, issue 21
https://doi.org/10.5194/acp-20-13417-2020
https://doi.org/10.5194/acp-20-13417-2020
Technical note
 | 
12 Nov 2020
Technical note |  | 12 Nov 2020

Technical Note: Effect of varying the λ = 185 and 254 nm photon flux ratio on radical generation in oxidation flow reactors

Jake P. Rowe, Andrew T. Lambe, and William H. Brune

Viewed

Total article views: 5,243 (including HTML, PDF, and XML)
HTML PDF XML Total Supplement BibTeX EndNote
3,226 1,678 339 5,243 769 428 374
  • HTML: 3,226
  • PDF: 1,678
  • XML: 339
  • Total: 5,243
  • Supplement: 769
  • BibTeX: 428
  • EndNote: 374
Views and downloads (calculated since 07 Jul 2020)
Cumulative views and downloads (calculated since 07 Jul 2020)

Viewed (geographical distribution)

Total article views: 5,243 (including HTML, PDF, and XML) Thereof 5,243 with geography defined and 0 with unknown origin.
Country # Views %
  • 1
1
 
 
 
 

Cited

Saved (final revised paper)

Latest update: 02 Nov 2026
Download
Short summary
We conducted a series of experiments in which the 185 to 254 nm photon flux ratio (I185 : I254) emitted by low-pressure mercury lamps installed in an oxidation flow reactor (OFR) was systematically varied using multiple novel lamp configurations. Integrated OH exposure values achieved for each lamp type were obtained as a function of OFR operating conditions. A photochemical box model was used to develop a generalized OH exposure estimation equation as a function of [H2O], [O3], and OH reactivity.
Share
Altmetrics
Final-revised paper
Preprint