Technical Note: Effect of varying the <i>λ</i> = 185 and 254&thinsp;nm photon flux ratio on radical generation in oxidation flow reactors

Rowe, Jake P.; Lambe, Andrew T.; Brune, William H.

doi:https://doi.org/10.5194/acp-20-13417-2020

Articles | Volume 20, issue 21

Atmos. Chem. Phys., 20, 13417–13424, 2020

https://doi.org/10.5194/acp-20-13417-2020

© Author(s) 2020. This work is distributed under
the Creative Commons Attribution 4.0 License.

Atmos. Chem. Phys., 20, 13417–13424, 2020

https://doi.org/10.5194/acp-20-13417-2020

© Author(s) 2020. This work is distributed under
the Creative Commons Attribution 4.0 License.

Articles | Volume 20, issue 21

Technical note 12 Nov 2020

Technical note | 12 Nov 2020

Technical Note: Effect of varying the λ = 185 and 254 nm photon flux ratio on radical generation in oxidation flow reactors

Jake P. Rowe et al.

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Final revised paper (published on 12 Nov 2020)
Supplement to the final revised paper
Preprint (discussion started on 07 Jul 2020)
Supplement to the preprint

Interactive discussion

Status: closed

AC: Author comment | RC: Referee comment | SC: Short comment | EC: Editor comment

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RC1: 'Review of “Technical Note: Effect of varying the λ = 185 and 254 nm photon flux ratio on radical generation in oxidation flow reactors”', Anonymous Referee #1, 16 Aug 2020
RC2: 'Review "Technical Note: Effect of varying the λ = 185 and 254 nm photon flux ratio on radical generation in oxidation flow reactors"', Anonymous Referee #2, 21 Sep 2020
AC1: 'final response', Andrew Lambe, 29 Sep 2020

Peer-review completion

AR: Author's response | RR: Referee report | ED: Editor decision

AR by Andrew Lambe on behalf of the Authors (29 Sep 2020) Author's response Manuscript

ED: Publish as is (05 Oct 2020) by Eliza Harris

Short summary

We conducted a series of experiments in which the 185 to 254 nm photon flux ratio (I₁₈₅ : I₂₅₄) emitted by low-pressure mercury lamps installed in an oxidation flow reactor (OFR) was systematically varied using multiple novel lamp configurations. Integrated OH exposure values achieved for each lamp type were obtained as a function of OFR operating conditions. A photochemical box model was used to develop a generalized OH exposure estimation equation as a function of [H₂O], [O₃], and OH reactivity.