Articles | Volume 20, issue 21
Technical note
12 Nov 2020
Technical note |  | 12 Nov 2020

Technical Note: Effect of varying the λ = 185 and 254 nm photon flux ratio on radical generation in oxidation flow reactors

Jake P. Rowe, Andrew T. Lambe, and William H. Brune


Interactive discussion

Status: closed
Status: closed
AC: Author comment | RC: Referee comment | SC: Short comment | EC: Editor comment
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Peer-review completion

AR: Author's response | RR: Referee report | ED: Editor decision
AR by Andrew Lambe on behalf of the Authors (29 Sep 2020)  Author's response   Manuscript 
ED: Publish as is (05 Oct 2020) by Eliza Harris
AR by Andrew Lambe on behalf of the Authors (05 Oct 2020)
Short summary
We conducted a series of experiments in which the 185 to 254 nm photon flux ratio (I185 : I254) emitted by low-pressure mercury lamps installed in an oxidation flow reactor (OFR) was systematically varied using multiple novel lamp configurations. Integrated OH exposure values achieved for each lamp type were obtained as a function of OFR operating conditions. A photochemical box model was used to develop a generalized OH exposure estimation equation as a function of [H2O], [O3], and OH reactivity.
Final-revised paper