Articles | Volume 15, issue 8
https://doi.org/10.5194/acp-15-4197-2015
https://doi.org/10.5194/acp-15-4197-2015
Research article
 | 
23 Apr 2015
Research article |  | 23 Apr 2015

Vapor wall deposition in Teflon chambers

X. Zhang, R. H. Schwantes, R. C. McVay, H. Lignell, M. M. Coggon, R. C. Flagan, and J. H. Seinfeld

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We present an experimental protocol to constrain the nature of organic vapor--wall deposition in Teflon chambers and develop an empirical model to predict the wall-induced deposition rate of intermediate/semi/non-volatility organic vapors in chambers.
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