Articles | Volume 15, issue 8
Atmos. Chem. Phys., 15, 4197–4214, 2015
https://doi.org/10.5194/acp-15-4197-2015
Atmos. Chem. Phys., 15, 4197–4214, 2015
https://doi.org/10.5194/acp-15-4197-2015

Research article 23 Apr 2015

Research article | 23 Apr 2015

Vapor wall deposition in Teflon chambers

X. Zhang et al.

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AC: Author comment | RC: Referee comment | SC: Short comment | EC: Editor comment
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AR: Author's response | RR: Referee report | ED: Editor decision
AR by Xuan Zhang on behalf of the Authors (07 Feb 2015)  Author's response
ED: Referee Nomination & Report Request started (17 Feb 2015) by V. Faye McNeill
RR by Anonymous Referee #2 (12 Mar 2015)
RR by Anonymous Referee #3 (25 Mar 2015)
ED: Publish subject to technical corrections (25 Mar 2015) by V. Faye McNeill
AR by Xuan Zhang on behalf of the Authors (09 Apr 2015)  Author's response    Manuscript
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Short summary
We present an experimental protocol to constrain the nature of organic vapor--wall deposition in Teflon chambers and develop an empirical model to predict the wall-induced deposition rate of intermediate/semi/non-volatility organic vapors in chambers.
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