Articles | Volume 15, issue 8
https://doi.org/10.5194/acp-15-4197-2015
© Author(s) 2015. This work is distributed under
the Creative Commons Attribution 3.0 License.
the Creative Commons Attribution 3.0 License.
https://doi.org/10.5194/acp-15-4197-2015
© Author(s) 2015. This work is distributed under
the Creative Commons Attribution 3.0 License.
the Creative Commons Attribution 3.0 License.
Vapor wall deposition in Teflon chambers
Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, USA
R. H. Schwantes
Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, USA
R. C. McVay
Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, CA, USA
H. Lignell
Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, CA, USA
M. M. Coggon
Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, CA, USA
R. C. Flagan
Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, USA
Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, CA, USA
Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA, USA
Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, CA, USA
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Short summary
We present an experimental protocol to constrain the nature of organic vapor--wall deposition in Teflon chambers and develop an empirical model to predict the wall-induced deposition rate of intermediate/semi/non-volatility organic vapors in chambers.
We present an experimental protocol to constrain the nature of organic vapor--wall deposition in...
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