Articles | Volume 15, issue 14
Atmos. Chem. Phys., 15, 7831–7840, 2015
https://doi.org/10.5194/acp-15-7831-2015
Atmos. Chem. Phys., 15, 7831–7840, 2015
https://doi.org/10.5194/acp-15-7831-2015

Research article 16 Jul 2015

Research article | 16 Jul 2015

Formation of hydroxyl radicals from photolysis of secondary organic aerosol material

K. M. Badali et al.

Download

Interactive discussion

Status: closed
Status: closed
AC: Author comment | RC: Referee comment | SC: Short comment | EC: Editor comment
Printer-friendly Version - Printer-friendly version Supplement - Supplement

Peer-review completion

AR: Author's response | RR: Referee report | ED: Editor decision
AR by Kaitlin Badali on behalf of the Authors (03 Jun 2015)  Author's response    Manuscript
ED: Publish as is (03 Jun 2015) by V. Faye McNeill
Download
Short summary
This is the first paper to demonstrate that SOA material forms OH radicals upon UV illumination. We quantify the OH formation rates in solution and show species other than H2O2, mostly probably ROOH molecules, are the likely source of the OH. The importance of an OH source from SOA is that photochemical processing within both cloudwater and aerosol particles may arise subsequent to the formation of these radicals.
Altmetrics
Final-revised paper
Preprint