Articles | Volume 15, issue 14
https://doi.org/10.5194/acp-15-7831-2015
https://doi.org/10.5194/acp-15-7831-2015
Research article
 | 
16 Jul 2015
Research article |  | 16 Jul 2015

Formation of hydroxyl radicals from photolysis of secondary organic aerosol material

K. M. Badali, S. Zhou, D. Aljawhary, M. Antiñolo, W. J. Chen, A. Lok, E. Mungall, J. P. S. Wong, R. Zhao, and J. P. D. Abbatt

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This is the first paper to demonstrate that SOA material forms OH radicals upon UV illumination. We quantify the OH formation rates in solution and show species other than H2O2, mostly probably ROOH molecules, are the likely source of the OH. The importance of an OH source from SOA is that photochemical processing within both cloudwater and aerosol particles may arise subsequent to the formation of these radicals.
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