Articles | Volume 11, issue 14
https://doi.org/10.5194/acp-11-6895-2011
© Author(s) 2011. This work is distributed under
the Creative Commons Attribution 3.0 License.Explicit modelling of SOA formation from α-pinene photooxidation: sensitivity to vapour pressure estimation
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- Final revised paper (published on 18 Jul 2011)
- Supplement to the final revised paper
- Preprint (discussion started on 29 Mar 2011)
- Supplement to the preprint
Interactive discussion
AC: Author comment | RC: Referee comment | SC: Short comment | EC: Editor comment
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- Supplement
- RC C2623: 'Referee comment', Anonymous Referee #1, 03 May 2011
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RC C3266: 'Reviewer comment', Anonymous Referee #2, 12 May 2011
- AC C5551: 'Final response to both referees', Richard Valorso, 28 Jun 2011